Effects of low level boron doping of the i-layer on the performance of SiC p-i-n devices
- 31 January 1986
- journal article
- Published by Elsevier in Solar Energy Materials
- Vol. 13 (1) , 65-73
- https://doi.org/10.1016/0165-1633(86)90029-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Effect of boron doping and its profile on characteristics of p-i-n a-Si:H solar cellsSolar Energy Materials, 1983
- Theory and experiment on the surface-photovoltage diffusion-length measurement as applied to amorphous siliconJournal of Applied Physics, 1983
- Collection length of holes in a-Si:H by surface photovoltage using a liquid Schottky barrierApplied Physics Letters, 1982
- Mechanism of the Formation of Donor States in Heat-Treated SiliconPhysical Review B, 1958