Third-order nonlinear optical susceptibilities of amorphous SnO2−x thin films

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Abstract
Amorphous SnO2−x (x=0–1) thin films are prepared on glass substrates by using a radio‐frequency magnetron sputtering technique and the third‐order nonlinear optical susceptibilities χ(3) (−3ω; ω, ω, ω) are evaluated by the third‐harmonic generation (THG) method. The values of χ(3) are found to increase with decreasing the oxygen content in the samples. The χ(3) of the present sample is larger by several times than that of crystalline SnO2 thin film in which the χ(3) is about 10−12 esu order. These values are very large among those for inorganic materials at the nonresonant region.