Electron density of states of thin copper films
- 1 November 1975
- journal article
- Published by IOP Publishing in Journal of Physics F: Metal Physics
- Vol. 5 (11) , L194-L196
- https://doi.org/10.1088/0305-4608/5/11/005
Abstract
The allowed electron states and electron density of states have been calculated for copper films one, two and four atomic layers in thickness. The results show a severe narrowing of the d-band for very thin films which has disappeared by the time the film thickness reaches four layers. The results of the calculation are supported by UPS data.Keywords
This publication has 15 references indexed in Scilit:
- Surface and Bulk Contributions to Ultraviolet Photoemission Spectra of SiliconPhysical Review Letters, 1974
- The electronic structure of the (111) surface of siliconJournal of Physics C: Solid State Physics, 1973
- Electronic Structure of Ultrathin Transition and Noble Metal Films with Simple Metal InterfacesJournal of Vacuum Science and Technology, 1973
- Quantum size effect with arbitrary surface potentialJournal of Physics C: Solid State Physics, 1973
- Band theory of the quantum size effectJournal of Physics C: Solid State Physics, 1972
- Solutions of Schrodinger's equation at a band edge in a one dimensional crystalJournal of Physics C: Solid State Physics, 1972
- Photoemission from Surface States on TungstenPhysical Review Letters, 1972
- Band theory of the quantum size effect for a simple modelJournal of Physics C: Solid State Physics, 1971
- Determination of Electron Energy Bands by Phase-Shift Parametrization: Application to SilverPhysical Review B, 1971
- Theory of Electronic Properties of Thin Films of-Band MetalsPhysical Review B, 1970