Electronic band structure of (x=0.4 to 1.0) determined by infrared-induced intersite transitions
- 22 February 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 70 (8) , 1175-1178
- https://doi.org/10.1103/physrevlett.70.1175
Abstract
To investigate the band structure of nonmetallic (x=0.4–1.0), photon-induced hopping has been employed as a new method, in which transmission spectroscopy has been carried out from 10 to 12 000 . The photon-induced-hopping conduction edge has been found at 5200 . This edge does not shift with (x=0.4–1.0), whereas the absorption is proportional to 1-x. The charge-transfer absorption edge at 12 000 also does not shift with x. Using this method, the bandwidth has been determined to be 5200 . Obvious midgap states have not been observed.
Keywords
This publication has 20 references indexed in Scilit:
- Photon-Induced Hopping in Bi2Sr2Ca0.5Y0.5Cu2OyJapanese Journal of Applied Physics, 1992
- Optical spectra of : Effect of carrier doping on the electronic structure of the planePhysical Review B, 1991
- Electronic states in probed by soft-x-ray absorptionPhysical Review Letters, 1991
- Antiferromagnetic Spin Fluctuations and Superconductivity in Two-Dimensional Metals -A Possible Model for HighTcOxidesJournal of the Physics Society Japan, 1990
- Motion of a single hole in a quantum antiferromagnetPhysical Review B, 1989
- Metal-Insulator Transition in the Bi2Sr2Ca1-xYxCu2O8+y SystemJapanese Journal of Applied Physics, 1989
- Optical study of interacting donors in semiconductorsPhysical Review B, 1981
- Polarons in crystalline and non-crystalline materialsAdvances in Physics, 1969
- Far-Infrared Absorption in-Type Silicon Due to Photon-Induced HoppingPhysical Review Letters, 1965
- Low-Frequency Conductivity Due to Hopping Processes in SiliconPhysical Review B, 1961