Nanosecond-time-resolution thermal emission measurement during pulsed excimer-laser interaction with materials
- 1 January 1996
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 62 (1) , 51-59
- https://doi.org/10.1007/bf01568087
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Transient Temperature During Pulsed Excimer Laser Heating of Thin Polysilicon Films Obtained by Optical Reflectivity MeasurementJournal of Heat Transfer, 1995
- Measurement of solid–liquid interface temperature during pulsed excimer laser melting of polycrystalline silicon filmsApplied Physics Letters, 1994
- Time-resolved temperature measurements during rapid solidification of Si-As alloys induced by pulsed-laser meltingJournal of Applied Physics, 1993
- Study of excimer laser induced melting and solidification of Si by time-resolved reflectivity measurementsApplied Physics A, 1992
- Time-resolved reflectivity measurements on silicon and germanium using a pulsed excimer KrF laser heating beamPhysical Review B, 1986
- Silicon (Si)Published by Elsevier ,1985
- Time-resolved temperature measurement of pulsed laser irradiated germanium by thin-film thermocoupleApplied Physics Letters, 1984
- Measurement of Lattice Temperature of Silicon during Pulsed Laser AnnealingPhysical Review Letters, 1981