Application of X-ray mask fabrication technologies to high resolution, large diameter Ta Fresnel zone plates
- 28 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4) , 525-529
- https://doi.org/10.1016/s0167-9317(96)00202-x
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Quantum Wire Fabrication by E-Beam Elithography Using High-Resolution and High-Sensitivity E-Beam Resist ZEP-520Japanese Journal of Applied Physics, 1992
- Zone plate lenses for X-ray microscopyNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1988