Reactions of Bare Silicon Cluster Ions: Prototypical Deposition and Etching Versus Cluster Size
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Reaction of anionic and cationic silicon clusters with tungsten hexafluoride studied by fourier transform ion cyclotron resonance mass spectrometryChemical Physics Letters, 1986
- Silicon and germanium clusters. A theoretical study of their electronic structures and propertiesThe Journal of Chemical Physics, 1986
- Calculation of Magic Numbers and the Stability of Small Si ClustersPhysical Review Letters, 1986
- Structure and bonding in small silicon clustersPhysical Review Letters, 1985
- Comparison of XeF2 and F-atom reactions with Si and SiO2Applied Physics Letters, 1984
- Surface processes in plasma-assisted etching environmentsJournal of Vacuum Science & Technology B, 1983
- Hydrocarbon Bond Dissociation EnergiesAnnual Review of Physical Chemistry, 1982
- The reaction of fluorine atoms with siliconJournal of Applied Physics, 1981
- Heats of formation and dissociation of methylsilanes and chlorosilanes and derived radicalsJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1981
- Ion Cyclotron Resonance SpectroscopyAnnual Review of Physical Chemistry, 1971