Application of High-Current Ion-Implantation Systems in Semiconductor-Device Technology
- 1 January 1983
- book chapter
- Published by Springer Nature
Abstract
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This publication has 3 references indexed in Scilit:
- Displacement criterion for amorphization of silicon during ion implantationJournal of Applied Physics, 1981
- High Dose Ion Implantation into PhotoresistJournal of the Electrochemical Society, 1978
- The Role of Damage in the Annealing Characteristics of Ion Implanted SiJournal of the Electrochemical Society, 1970