Resistance in a Liquid-Liquid Interface. III. The Effect of Molecular Properties
- 1 June 1955
- journal article
- research article
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 23 (6) , 1095-1099
- https://doi.org/10.1063/1.1742195
Abstract
The diffusion of molecular sulfur across a saturated liquid‐liquid interface has been investigated for several molecular pairs, using a method previously described. The interfacial resistance does not directly depend on polarity of the liquids, nor can it be correlated with interfacial tension. High resistances are associated with liquids which show a high degree of hydrogen bonding. With suitable assumptions it is possible to calculate a free energy of activation for transfer across the interface. It appears that transfer in systems involving negligible resistance is analogous to van der Waals adsorption, while for systems involving high resistance the process is comparable to chemisorption.Keywords
This publication has 5 references indexed in Scilit:
- Diffusion through an Interface—Ternary SystemsThe Journal of Chemical Physics, 1952
- Self-Diffusion in CO2 at Moderate PressuresThe Journal of Chemical Physics, 1951
- Diffusion through an InterfaceThe Journal of Chemical Physics, 1951
- The The Mechanism of Diffusion of Ions across a Phase Boundary and through Cell Walls.The Journal of Physical Chemistry, 1950
- The Influence of Hindered Molecular Rotation on the Dielectric Constants of Water, Alcohols, and Other Polar LiquidsThe Journal of Chemical Physics, 1943