Use of influence diagrams and neural networks in modeling semiconductor manufacturing processes
- 1 January 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Semiconductor Manufacturing
- Vol. 4 (1) , 52-58
- https://doi.org/10.1109/66.75852
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Statistical equipment modeling for VLSI manufacturing: an application for LPCVDIEEE Transactions on Semiconductor Manufacturing, 1990
- Learning and optimization of machining operations using computing abilities of neural networksIEEE Transactions on Systems, Man, and Cybernetics, 1989
- Multiple sensor expert system for diagnostic reasoning, monitoring and control of mechanical systemsMechanical Systems and Signal Processing, 1988
- Dynamics of Alopex Process: Application to Optimization ProblemsPublished by Springer Nature ,1988
- Topological framework for representing and solving probabilistic inference problems in expert systemsIEEE Transactions on Systems, Man, and Cybernetics, 1988
- VLSI implementation of a neural network memory with several hundreds of neuronsAIP Conference Proceedings, 1986
- Parallel Distributed ProcessingPublished by MIT Press ,1986
- Optimization by Simulated AnnealingScience, 1983