Semiconductor behavior in amorphous AuSiO thin films
- 1 January 1970
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 2, 307-315
- https://doi.org/10.1016/0022-3093(70)90147-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Electrical and Structural Properties of Mixed Chromium and Silicon Monoxide FilmsJournal of Applied Physics, 1968
- Multifunction Monolithic Thin-Film Compatible DTL Logic Circuits for Data ProcessingIEEE Transactions on Electronic Computers, 1966
- Crystallization in Thin Films of Carbon and Silicon MonoxideJournal of Applied Physics, 1965
- Temperature Characteristics of Vacuum Deposited Dielectric FilmsReview of Scientific Instruments, 1962