Sublimation Rate of Silicon in High Vacuum
- 1 September 1963
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 2 (9)
- https://doi.org/10.1143/jjap.2.586
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Low Voltage Electron Diffraction Study of the Oxidation and Reduction of SiliconJournal of Applied Physics, 1962
- Vapor Pressure of Silicon and the Dissociation Pressure of Silicon CarbideThe Journal of Chemical Physics, 1961
- Diffusion of Impurities into Evaporating SiliconJournal of Applied Physics, 1959
- Determination of Adsorption Energy Heterogeneity of Solid SurfacesThe Journal of Chemical Physics, 1954