Characteristics Of A Gas-Puff Z-Pinch Plasma X-Ray Source

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Abstract
A high brightness plasma x-ray source is developed. This source can be linked to a conventional aligner by directing x-rays downwards into the atmosphere. By adopting the low pressure gas injection method, a wide discharge timing margin and strong x-ray emission are attained. X-rays having line spectra of 9-14 Å in wavelength are emitted from the Neon gas plasma. As high mask contrast can be obtained, submicron resist patterns can easily be replicated by using a 0.4 μm thick Ta absorber. The mask distortion due to mask heating is not a serious problem in He atmospheric exposure. The exposure time is about 13 seconds with a 3 Hz discharge repetition rate. Compared with a conventional source, a throughput 10 times greater is achieved.

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