Analytical solution for capacitive RF sheath
- 1 January 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 16 (6) , 638-644
- https://doi.org/10.1109/27.16552
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF DischargesIEEE Transactions on Plasma Science, 1986
- Power dissipated in low-pressure radio-frequency discharge plasmasJournal of Applied Physics, 1985
- Regular and Stochastic MotionPublished by Springer Nature ,1983
- Electrical Properties of RF Sputtering SystemsIBM Journal of Research and Development, 1979
- Influence of Scattering and Ionization on RF Impedance in Glow Discharge SheathsIBM Journal of Research and Development, 1979
- Application of RF Discharges to SputteringIBM Journal of Research and Development, 1970
- On the Origin of the Cosmic RadiationPhysical Review B, 1949