The Influence of Photoacid Structure on the Design and Performance of 1 93-nm Resists.
Open Access
- 1 January 1997
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 10 (3) , 503-510
- https://doi.org/10.2494/photopolymer.10.503
Abstract
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