Growth of fine holes in polyethylenenaphthalate film irradiated by fission fragments
- 1 April 1976
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 47 (4) , 1355-1358
- https://doi.org/10.1063/1.322840
Abstract
Growth of fine holes by chemical etching in polyethylenenaphthalate films exposed to fission fragments were examined by measuring gas flow through the films. The etching rate along tracks, the radial etching rate, and the bulk etching rate were determined at effective hole diameters of 100–1 000 Å and hole densities of approximately 108 cm−2. The effects of ethanol and surfactants on the etching rates were studied from the viewpoint of attaining less‐tapered holes.This publication has 5 references indexed in Scilit:
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- Electron microscopy of fine holes in polyethyleneterephthalate films irradiated by fission fragmentsJournal of Applied Physics, 1975
- Etching of Submicron Pores in Irradiated MicaJournal of Applied Physics, 1970
- Enhancement of Track Etching Rates in Charged Particle-irradiated Plastics by a Photo-oxidation EffectNature, 1968
- Chemical Etching of Charged-Particle Tracks in SolidsJournal of Applied Physics, 1962