Detection of SiF radicals with multiphoton ionization spectroscopy
- 2 August 1985
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 118 (4) , 444-447
- https://doi.org/10.1016/0009-2614(85)85408-7
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Etch products from the reaction of XeF2 with SiO2, Si3N4, SiC, and Si in the presence of ion bombardmentJournal of Vacuum Science & Technology B, 1983
- Plasma-Assisted Etching in MicrofabricationAnnual Review of Materials Science, 1983
- Detection of hydroxymethyl (CH2OH) radicals by resonance-enhanced multiphoton ionization spectroscopyThe Journal of Physical Chemistry, 1983
- Multiphoton ionization of the trifluoromethyl radicalThe Journal of Physical Chemistry, 1982
- Selective multiphoton ionization of geometric isomers. cis- and trans-1,2-DichloroetheneThe Journal of Physical Chemistry, 1981
- Mass spectrometric and spectroscopic study of the reaction of borane carbonyl and diborane with oxygen and nitrogen atomsThe Journal of Physical Chemistry, 1977
- Measurement of the radiative lifetime of thestate of SiFPhysical Review A, 1976
- The a4Σ−–X2Π Electronic Transition of SiFCanadian Journal of Physics, 1973
- Some Observations on the Spectra of the Diatomic Fluorides of Silicon, Germanium, Tin, and LeadProceedings of the Physical Society, 1959
- The Band Spectrum of Silicon Monofluoride, SiFProceedings of the Physical Society, 1958