Unusual polarization dependent optical erasure of surface relief gratings on azobenzene polymer films

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Abstract
Direct formation of surface relief gratings at modest intensities on azobenzene polymers has recently been accomplished. Unusual optical erasure of these surface relief gratings was observed. It is found that the optical erasure is dependent on the polarization state of the erasing beam as well as that of the recording beams used to form the gratings. Thus, gratings when formed memorize the polarization states which created them and influence their erasure behaviors accordingly. Direct transfer of patterns by photoprinting through a phase mask has been achieved.