HfO2–SiO2 interface in PVD coatings
- 1 September 2001
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 19 (5) , 2267-2271
- https://doi.org/10.1116/1.1382879
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Evaporation and ion assisted deposition of HfO2 coatings: Some key points for high power laser applicationsJournal of Vacuum Science & Technology A, 2000
- Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized siliconJournal of Applied Physics, 2000
- Structure and stability of ultrathin zirconium oxide layers on Si(001)Applied Physics Letters, 2000
- Hafnium and zirconium silicates for advanced gate dielectricsJournal of Applied Physics, 2000
- Electrical properties of hafnium silicate gate dielectrics deposited directly on siliconApplied Physics Letters, 1999
- Scaling the gate dielectric: Materials, integration, and reliabilityIBM Journal of Research and Development, 1999
- Investigation of optical damage mechanisms in hafnia and silica thin films using pairs of subnanosecond laser pulses with variable time delayJournal of Applied Physics, 1992
- Optical phonons of small crystalsReports on Progress in Physics, 1970