Growth and characterization of Si1−xGex/Si multilayers on patterned Si(001) substrates using gas source molecular beam epitaxy
- 1 July 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 12 (4) , 1139-1141
- https://doi.org/10.1116/1.579180
Abstract
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