Sputtering of Dielectrics by High-Frequency Fields
- 1 October 1962
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 33 (10) , 2991-2992
- https://doi.org/10.1063/1.1728549
Abstract
A novel method for sputtering insulators in the plasma of a low‐pressure discharge is described. The method utilizes rf fields whereby the positive charge accumulation at the target surface, resulting from positive ion bombardment, is periodically neutralized during each cycle. The method has many useful applications for cleaning, etching, and sputtering of insulators, as well as for removing deposits from observation windows.This publication has 6 references indexed in Scilit:
- Sputtering Yields at Very Low Bombarding Ion EnergiesJournal of Applied Physics, 1962
- Atom Ejection in Low Energy Sputtering of Single Crystals of fcc Metals and of Ge and SiJournal of Applied Physics, 1962
- Production and Analysis of a Large-Diameter Plasma BeamJournal of Applied Physics, 1961
- Atom Ejection Patterns in Single-Crystal SputteringJournal of Applied Physics, 1960
- Radiation Effects of Bombardment of Quartz and Vitreous Silica by 7.5-kev to 59-kev Positive IonsPhysical Review B, 1960
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