Carbon nitride thin films formed by low energy ion beam deposition with positive and negative ions
- 1 January 1997
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 121 (1-4) , 73-78
- https://doi.org/10.1016/s0168-583x(96)00642-8
Abstract
No abstract availableKeywords
This publication has 107 references indexed in Scilit:
- Formation of the crystalline β-C3N4 phase by dual ion beam sputtering depositionMaterials Letters, 1995
- Synthesis of covalent carbon—nitride solids: Alternatives to diamond?Advanced Materials, 1994
- Synthesis of Carbon Nitride in Plasma ArcJournal of the Electrochemical Society, 1994
- Formation of Carbon Nitride Films by Means of Ion Assisted Dynamic Mixing (IVD) MethodJapanese Journal of Applied Physics, 1993
- Electrical, optical and ESR study of thin films of plasma polymerized acrylonitrileJournal of Materials Science, 1989
- A novel graphite-like material of composition BC3, and nitrogen–carbon graphitesJournal of the Chemical Society, Chemical Communications, 1986
- Formation of CN− radicals by sequential implantation of carbon and nitrogen ions into KClJournal of Applied Physics, 1982
- Paracyanogen: its formation and properties. Part IJournal of the Chemical Society, 1954
- THE PHOTOCHEMICAL POLYMERIZATION OF CYANOGENJournal of the American Chemical Society, 1932
- Uber einige Stickstoff ‐ VerbindungenEuropean Journal of Organic Chemistry, 1834