LPCVD of aluminium in a batch-type load-locked multi-chamber processing system
- 13 January 2003
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 122-128
- https://doi.org/10.1109/vmic.1989.78014
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Vapor Phase Deposition of Aluminum Film on Quartz SubstrateJournal of the Electrochemical Society, 1983
- Production of aluminum and aluminum coatings by thermal decomposition of aluminum alkylsMetallurgical Transactions B, 1980
- Aluminum coatings by the decomposition of alkylsThin Solid Films, 1977
- Chlorination of silica surfacesThe Journal of Physical Chemistry, 1973