Photodegradation of teflon AF1600 during XPS analysis

• 7 November 1998
• journal article
• research article
• Published by Wiley in Journal of Applied Polymer Science
• Vol. 70  (6) , 1201-1207
• https://doi.org/10.1002/(sici)1097-4628(19981107)70:6<1201::aid-app17>3.0.co;2-1

Abstract

Keywords

• FLUOROPOLYMER
• TEFLON AF
• X-RAY PHOTOELECTRON SPECTROSCOPY
• PHOTODEGRADATION
• MASS SPECTROSCOPY