Novel fabrication method for Si1 − xTixO2 thin films with graded composition profiles by liquid phase deposition

Abstract
A novel technique for the direct synthesis of Si1 − xTixO2 thin films with graded composition profiles has been studied in aqueous solution, in which the (NH4)2SiF6 solutions were added into the (NH4)2TiF6 master solution under time- and rate-controlled reaction conditions: the composition of the films in the direction of the film thickness was successfully controlled over a wide range by this technique.
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