Parallel fabrication on chemically etched silicon using scanning tunneling microscopy
- 1 July 1992
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 42-44, 1303-1308
- https://doi.org/10.1016/0304-3991(92)90439-q
Abstract
No abstract availableKeywords
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- Direct writing of 10 nm features with the scanning tunneling microscopeApplied Physics Letters, 1988
- Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBEJournal of the Electrochemical Society, 1986
- Studies of tunnel MOS diodes II. Thermal equilibrium considerationsJournal of Physics D: Applied Physics, 1971