The Effect of Layer Thickness on the Reaction Kinetics of Nickel/Silicon Multilayer Films
- 1 January 1987
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Differential scanning calorimetry study of solid-state amorphization in multilayer thin-film Ni/ZrApplied Physics Letters, 1987
- Propagation of explosive crystallization in thin Rh–Si multilayer filmsJournal of Vacuum Science & Technology A, 1986
- Growth kinetics of planar binary diffusion couples: ’’Thin-film case’’ versus ’’bulk cases’’Journal of Applied Physics, 1982
- Influence of the nature of the Si substrate on nickel silicide formed from thin Ni filmsThin Solid Films, 1976
- Structure and growth kinetics of Ni2Si on siliconThin Solid Films, 1975
- Reaction Kinetics in Differential Thermal AnalysisAnalytical Chemistry, 1957