Abstract
Thallic oxide, “T12O3,” has been shown to be a degenerate n‐type semiconductor with resistivity varying from 60 to 150 μΩ‐cm over the range 4° to 900°K. The carrier concentration was 7 × 1020 cm−3 and is temperature independent. Room‐temperature Hall mobility was 105 cm2 V−1 s−1, increasing to 130 cm2 V−1 s−1 below 70°K. Donor states were shown to be native defects, probably oxygen vacancies.

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