Double exposure stabilization of positive photoresist

• 1 February 1985
• journal article
• research article
• Published by Wiley in Journal of Applied Polymer Science
• Vol. 30  (2) , 547-555
• https://doi.org/10.1002/app.1985.070300208

Abstract

Keywords

• POSITIVE PHOTORESIST
• DOUBLE EXPOSURE
• EXPOSURE STABILIZATION
• CHEMICAL RESISTANCE
• RESIST FILM
• ADHESION
• THERMAL