Chemical vapour deposition on silicon: In situ surface studies
- 30 November 1984
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 112 (2) , 190-194
- https://doi.org/10.1016/0009-2614(84)85020-4
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Photodeposition of Ti and application to direct writing of Ti:LiNbO3 waveguidesApplied Physics Letters, 1983
- Ultraviolet photodecomposition for metal deposition: Gas versus surface phase processesApplied Physics Letters, 1983
- Laser-induced gas-surface interactionsSurface Science Reports, 1983
- Analysis of thin films arising from electron-, ion- and photon-beam-induced decomposition of Cr(CO)6 and Al(CH3)3Thin Solid Films, 1982
- Laser chemical vapor deposition: A technique for selective area depositionJournal of Applied Physics, 1981
- Direct Writing of Refractory Metal Thin Film Structures by Laser PhotodepositionJournal of the Electrochemical Society, 1981
- Spatially delineated growth of metal films via photochemical prenucleationApplied Physics Letters, 1981
- UV photolysis of van der waals molecular filmsChemical Physics Letters, 1981
- A UPS and LEED/Auger study of adsorbates on Fe(110)Applied Physics A, 1977
- Electron beam induced effects on gas adsorption utilizing auger electron spectroscopy: Co and O2 on Si: I. Adsorption studiesSurface Science, 1974