A novel silicon containing chemical amplification resist for electron beam lithography
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 69-72
- https://doi.org/10.1016/0167-9317(91)90050-n
Abstract
No abstract availableKeywords
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- Chemical amplification in the design of dry developing resist materialsPolymer Engineering & Science, 1983
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