Electron-sensitive resists. II. Positive resists derived from high polymers of methyl methacrylate, methyl α-chloroacrylate, and hexyl methacrylate
- 1 January 1978
- journal article
- research article
- Published by Wiley in Journal of Applied Polymer Science
- Vol. 22 (1) , 53-58
- https://doi.org/10.1002/app.1978.070220105
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