A Route to Nanoscopic SiO2 Posts via Block Copolymer Templates

• 31 May 2001
• journal article
• research article
• Published by Wiley in Advanced Materials
• Vol. 13  (11) , 795-797
• https://doi.org/10.1002/1521-4095(200106)13:11<795::aid-adma795>3.0.co;2-1

Abstract

Keywords

• BLOCK COPOLYMERS
• REACTIVE ION ETCHING (RIE)
• SILICON DIOXIDE
• THIN FILMS