Electrochemical method for defect delineation in thin-film SOI wafers
- 13 January 2003
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
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This publication has 1 reference indexed in Scilit:
- Catastrophic breakdown in silicon oxides: The effect of Fe impurities at the SiO2-Si interfaceJournal of Applied Physics, 1987