Measurement of thin film parameters using substrate excitation of leaky modes

Publisher Website

1 November 1983

journal article
Published by Elsevier in Optics Communications

Vol. 48 (2) , 113-115
https://doi.org/10.1016/0030-4018(83)90368-1

Abstract

No abstract available

Keywords

This publication has 5 references indexed in Scilit:

An Evaluation of the Prism Coupler for Measuring the Thickness and Refractive Index of Dielectric Films on Silicon Substrates
Journal of the Electrochemical Society, 1979
Refractive index of a native oxide anodically grown on GaAs
Applied Physics Letters, 1977
The Prism-film Coupler as a Precision InstrumentPart I. Accuracy and Capabilities of Prism Couplers as Instruments
Optica Acta: International Journal of Optics, 1975
Measurement of Thin Film Parameters with a Prism Coupler
Applied Optics, 1973
MODES OF PROPAGATING LIGHT WAVES IN THIN DEPOSITED SEMICONDUCTOR FILMS
Applied Physics Letters, 1969