Homogeneous Gas Phase Nucleation of Silane in Low Pressure Chemical Vapor Deposition (LPCVD)
- 1 September 1988
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 135 (9) , 2378-2379
- https://doi.org/10.1149/1.2096275
Abstract
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