Demonstration of a nanolithographic technique using a self‐assembled monolayer resist for neutral atomic cesium
- 1 January 1997
- journal article
- research article
- Published by Wiley in Advanced Materials
- Vol. 9 (1) , 52-55
- https://doi.org/10.1002/adma.19970090111
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Nanolithography with metastabile heliumApplied Physics B Laser and Optics, 1996
- Light force cooling, focusing, and nanometer-scale deposition of aluminum atomsOptics Letters, 1995
- A Selective Etching Solution for Use with Patterned Self-Assembled Monolayers of Alkanethiolates on GoldChemistry of Materials, 1995
- Microlithography by Using Neutral Metastable Atoms and Self-Assembled MonolayersScience, 1995
- Atom opticsPhysics Reports, 1994
- Laser-Focused Atomic DepositionScience, 1993
- Using light as a lens for submicron, neutral-atom lithographyPhysical Review Letters, 1992
- Using diode lasers for atomic physicsReview of Scientific Instruments, 1991
- Fabrication of thin-film metal nanobridgesApplied Physics Letters, 1989