Kinetics and Uniformity of Deposition of Borophosphosilicate Glass from Silane and Oxygen in a Single‐Wafer Reactor
- 1 September 1992
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 139 (9) , 2573-2579
- https://doi.org/10.1149/1.2221266
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: