Recent Development in Photosensitive Polyimide (PSPI)
Open Access
- 1 January 2001
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 14 (5) , 677-687
- https://doi.org/10.2494/photopolymer.14.677
Abstract
Photosensitive polyimides (PSPIs) are attracting much attention as an insulating materials for microelectronic applications. PSPIs can be directly patterned, simplify processing steps and do not need a photoresist to be used in the micro-lithographic stage, nor a toxic etchant. This review introduces the recent development of PSPIs with emphasis placed on the chemistry responsible for images.Keywords
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