Imaging results for resist films exposed to EUV radiation
- 31 July 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 723-728
- https://doi.org/10.1016/s0167-9317(02)00504-x
Abstract
No abstract availableKeywords
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- Ultrathin photoresists for EUV lithographyPublished by SPIE-Intl Soc Optical Eng ,1999
- Top-surface imaging resists for EUV lithographyPublished by SPIE-Intl Soc Optical Eng ,1998