Ti- and Be-X-ray masks with alignment windows for the LIGA process
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 323-326
- https://doi.org/10.1016/0167-9317(91)90103-k
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Status And Prospects Of Sic-Masks For Synchrotron Based X-Ray LithographyPublished by SPIE-Intl Soc Optical Eng ,1987
- Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)Microelectronic Engineering, 1986
- A technique for the determination of stress in thin filmsJournal of Vacuum Science & Technology B, 1983
- X‐Ray Lithography Mask TechnologyJournal of the Electrochemical Society, 1981