Structure of Al-N Films Deposited by a Quantitative Dual Ion Beam Process
- 1 January 1983
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Quantitative ion beam process for the deposition of compound thin filmsApplied Physics Letters, 1983
- Diffusion enhancement due to low-energy ion bombardment during sputter etching and depositionJournal of Applied Physics, 1980