Mass-Spectrometric Investigation of the Nickel—Fluorine Surface Reaction

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Abstract
Mass-spectrometric measurements have been made of the reaction of polycrystalline nickel at temperatures between 900° and 1600°K with fluorine at pressures between 10−7 and 10−4 torr. Gaseous NiF, NiF2, and F are the major products, and are formed rapidly on the surface at rates linear with fluorine pressure. NiF is present on the surface over the entire temperature range and desorbs above 1100°C; the desorption step involves rupture of a Ni (substrate)—NiF bond and has an activation energy of 28 kcal mole−1. NiF2 formation and desorption are important between 900° and 1600°K with a maximum rate at 1250°—1300°K. The rate-limiting step in the formation of NiF2 has an activation energy of 39 kcal mole−1 and is probably dissociation of fluorine on the surface.

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