A chemical method for the deposition of Bi2S3 thin films from a non-aqueous bath
- 14 December 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 359 (2) , 136-140
- https://doi.org/10.1016/s0040-6090(99)00532-5
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Preparation and characterization of Bi2S3 thin films spray deposited from non-aqueous mediaThin Solid Films, 1996
- Chemical deposition of Bi2S3 thin films from thioacetamide bathMaterials Chemistry and Physics, 1995
- Nonaqueous chemical bath deposition of Bi2S3 thin filmsMaterials Chemistry and Physics, 1993
- Chemical deposition of metal chalcogenide thin filmsMaterials Chemistry and Physics, 1991
- Novel chemical preparative route for semiconducting MoSe2 thin filmsJournal of Materials Chemistry, 1991
- MoS2−xOx solid solutions in thin films produced by rf-sputter-depositionJournal of Materials Research, 1990
- MoS3 Thin Film Cathodes Prepared by Chemical Vapor DepositionJournal of the Electrochemical Society, 1989
- Application of Van der Waals epitaxy to highly heterogeneous systemsJournal of Crystal Growth, 1989
- Growth Kinetics and Polymorphism of Chemically Deposited CdS FilmsJournal of the Electrochemical Society, 1980
- The photoelectrochemical properties of anodic Bi2S3 filmsJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1979