Geometrical aspect of electrodeposition: The Hecker effect
- 1 June 1991
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review A
- Vol. 43 (12) , 6908-6916
- https://doi.org/10.1103/physreva.43.6908
Abstract
We have studied the growth of electrodeposits from solutions of copper sulfate in thin cells, and focused our attention on the spectacular morphological transitions that occur in almost every experimental condition. We give experimental evidence and numerical and theoretical results showing that these transitions are due to the propagation of charged impurities leaving the dissolving anode at the beginning of the growth and hitting the deposit at later times. The arrival of the impurity front against the growing deposit modifies the growing conditions, thus leaving on the deposit the trace of an almost homothetical ‘‘ghost’’ image of the anode.Keywords
This publication has 13 references indexed in Scilit:
- The role of the anions in the growth speed of fractal electrodepositsJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1990
- Laplace- and diffusion-field-controlled growth in electrochemical depositionPhysical Review Letters, 1989
- Morphological Evolution in Zinc ElectrodepositionJournal of the Electrochemical Society, 1989
- Self-Similarity of Diffusion-Limited Aggregates and Electrodeposition ClustersPhysical Review Letters, 1988
- Copper electrodeposits in paper supportPhysical Review A, 1988
- Stability of the dense radial morphology in diffusive pattern formationPhysical Review Letters, 1987
- Formation of a Dense Branching Morphology in Interfacial GrowthPhysical Review Letters, 1986
- Morphology and Microstructure in Electrochemical Deposition of ZincPhysical Review Letters, 1986
- Dendritic and Fractal Patterns in Electrolytic Metal DepositsPhysical Review Letters, 1986
- Fractal Structures of Zinc Metal Leaves Grown by ElectrodepositionPhysical Review Letters, 1984