Core-level shifts on the H2O exposed Ge(100)2×1 surface
- 1 May 1989
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 7 (3) , 2044-2048
- https://doi.org/10.1116/1.575967
Abstract
Core-level spectroscopy and valence-band photoelectron spectroscopy were used to study the Ge(100)2×1 surface dosed with 0.5–100 L H2O at 160 K. It is determined that H2O adsorbs molecularly at 160 K and forms ice. The H2O molecules dissociate into H and OH radicals on the Ge(100)2×1 surface when the sample is heated to 300 K. A simple adsorption model that accounts for the calculated H and OH coverages is proposedKeywords
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