InP Etching Using Chemically Assisted Ion Beam Etching ( Cl2 / Ar ) Formation of InCl x Clusters under High Concentration of Chlorine
- 1 May 1999
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 146 (5) , 1918-1920
- https://doi.org/10.1149/1.1391865
Abstract
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