Enhanced Backscattering Due to Total Internal Reflection at a Dielectric-air Interface
- 1 February 1995
- journal article
- research article
- Published by Taylor & Francis in Journal of Modern Optics
- Vol. 42 (2) , 257-269
- https://doi.org/10.1080/09500349514550251
Abstract
We report the observation of enhanced backscattering in the scattering of light from a photoresist film with a one-dimensional randomly rough interface deposited on a flat parallel glass plate. The random interface is illuminated from the photoresist side, entering the sample through the glass plate. Angular scattering measurements for this sample are presented and compared with results obtained numerically using two approximate models to describe the interaction between the light and the sample. The observed backscattering enhancement is believed to be due to multiple scattering processes at the photoresist–air interface, where total internal reflection can take place.Keywords
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