Growth of silicon nitride by PECVD

• 1 February 1992
• conference paper
• Published by SPIE-Intl Soc Optical Eng
• p. 546-554
• https://doi.org/10.1117/12.57013

Abstract

Keywords

• ELLIPSOMETRY
• PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
• NITROGEN
• ABSORPTION
• SILICON