Investigation of the Sputtering of Aluminum Using Atomic-Absorption Spectroscopy
- 1 February 1970
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 41 (2) , 742-748
- https://doi.org/10.1063/1.1658742
Abstract
The techniques of atomic‐absorption and emission spectroscopy have been used to detect atoms ejected from an aluminum cathode which is sputtered in a glow discharge in argon. The rate of deposition of the sputtered material is measured using a piezoelectric microbalance which is capable of measuring deposition rates as small as 9.2×10−8 G min−1. The use of atomic‐absorption spectroscopy is shown to be a sensitive and reliable method for the study of the sputtering process. Experimental results indicate that some of the sputtered material in the glow discharge exists in the form of ``molecules.'' However, the absolute numbers of sputtered atoms has not been determined due to uncertainties in the tabulated values of atomic‐transition probabilities.This publication has 6 references indexed in Scilit:
- Low-Energy Sputtering Yields by Resonance Absorption and Emission Spectroscopic MethodsJournal of Applied Physics, 1964
- Energy Distribution of Sputtered Cu AtomsJournal of Applied Physics, 1964
- Mass Spectrometric Study of Neutral Particles Sputtered from Cu by 0- to 100-eV Ar IonsJournal of Applied Physics, 1964
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961
- Verwendung von Schwingquarzen zur W gung d nner Schichten und zur Mikrow gungThe European Physical Journal A, 1959
- Sputtering by Ion BombardmentPublished by Elsevier ,1955